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Time- resolved photoluminescence studies of Al0.72Ga0.28N films with incommensurate chemical ordering

机译:Al 0.72 GA 0.28 N薄膜的时间分辨的光致发光研究,具有不称除化学订购的薄膜

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An important topic in the understanding of AlGaN alloys for deep ultraviolet emitters is the role of carrier localization on radiative lifetime and emission efficiency. Electron and hole wavefunction overlap, and therefore radiative lifetime and recombination efficiency, can be strongly influenced by the degree and nature of chemical ordering in the AlGaN alloy, with spatially indirect, type II-like transitions predicted to occur between electrons in ordered alloy regions and holes in random alloy regions for Al contents in the 40% to 90% range [1]. In this paper, we study the photoluminescence (PL) lifetimes in AlGaN alloys with incommensurate chemical ordering. AlGaN films were grown by RF plasma-assisted MBE under different kinetic conditions. The compositions in all films were maintained at a constant value of 72 % AlN mole fraction by using the same Al flux, while the kinetics of growth were controlled by varying the Ga flux and thus the III / V flux ratio during deposition of the various films, with some of the films grown under Ga-rich conditions and others under N-rich conditions. The structure of these films was previously investigated by XRD using synchrotron radiation and by SED-TEM [2]. These spectra show that the characteristic (0002) diffraction is identical in all samples, from which the composition of the films was inferred. However, in addition to the (0002) diffractions all samples show additional superlattice peaks indicative of atomic ordering. Specifically, the analysis of the diffraction data indicates that the films grown under N-rich conditions have a superlattice structure consistent with 4 MLs periodicity, while those grown under III /V ~1 or III /V > 1 (Ga-rich conditions) have a superlattice structure with a repeat distance that has no clear relationship with the crystal lattice (incommensurate ordering). This type of chemical ordering was attributed to a change of the growth mode from vapor phase to liquid phase epitaxy a- s the Ga flux increases [3]. The latter growth mode leads to compositional inhomogeneities and thus potential fluctuations in the band structure of the films.
机译:理解深紫紫外线发射器的AlGaN合金的一个重要课题是载体定位对辐射寿命和发射效率的作用。电子和孔波段重叠,因此辐射寿命和复合效率,可以强烈地受到AlGaN合金中化学排序的程度和性质的强烈影响,具有空间间接,预测II型的型转变,预测有序合金区域的电子之间的电磁之间发生在40%至90%范围内的Al含量的随机合金区域中的孔[1]。在本文中,我们研究了丙醇合金中的光致发光(PL)寿命,其具有不加密的化学排序。在不同的动力学条件下,射频辅助MBE在射频等离子体辅助MBE中生长。通过使用相同的Al通量,所有薄膜中的组合物保持在72%Aln摩尔分数的恒定值,而通过改变Ga通量来控制生长动力学,从而控制各种薄膜的III / V助熔剂比,一些薄膜在富含GA的条件下种植,其他薄膜在富含氮的条件下。先前使用同步辐射和SED-TEM [2]通过XRD研究了这些薄膜的结构[2]。这些光谱表明,在所有样品中,特征(0002)衍射在所有样品中都是相同的,从中推断出薄膜的组成。然而,除了(0002)衍射外,所有样品都显示出指示原子序排序的额外超晶格峰。具体地,对衍射数据的分析表明,在富N-富条件下生长的薄膜具有与4mL的周期性一致的超晶格结构,而在III / V〜1或III / V> 1(GA-Rich条件下)的生长则具有一致的超晶格结构具有重复距离的超晶格结构,与晶格无明确的关系(不计情排序)。这种类型的化学排序归因于从气相与液相外延A的生长模式的变化,GA通量增加[3]。后一种生长模式导致组成不均匀性,从而导致薄膜的带结构中的潜在波动。

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