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Complementary oxide memristor technology facilitating both inhibitory and excitatory synapses for potential neuromorphic computing applications

机译:互补氧化物椎管技术,促进潜在的神经形态计算应用抑制和兴奋性突触

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A new family of crystalline oxides is identified that provide a method of producing complementary memristance (both n and p-type having been demonstrated) with unusually large demonstrated memristance behavior. To the best of our knowledge, these are the only devices having a large enough memristance to have measureable memristance at the macroscopic (10's to 100's of um device size) scale. Additionally, the oxides are highly conducting (low loss) with resistivities for both n and p-type variants in the ~5E-4 ohm-cm range. Complementary Oxide Memristors (both n-type and p-type) have been demonstrated in the same material contrasting all other known memristor technologies which are unipolar. Such behavior could be useful in future neuromorphic computing since n-type material exhibits inhibitory synaptic response (increasing resistance with time/voltage) while p-type material exhibits excitatory synaptic response (decreasing resistance with time/voltage). In principle (not yet demonstrated) this core complementary technology can fully implement neuron/synapse brain function without the need for traditional CMOS.
机译:鉴定了一种新的结晶氧化物系列,其提供一种产生互补留下的方法(已经证明了N和P型的N和P型),具有异常大的显示的忆蚀行为。据我们所知,这些是唯一足够大的存储器的唯一设备,以在宏观(10到100个UM器件尺寸)刻度上具有可测量的忆阻。另外,氧化物具有高导电(低损耗),其具有〜5E-4欧姆-CM范围内的N和P型变体的电阻性。在与单极的所有其他已知的忆阻技术形成对比的相同材料中,已经证明了互补氧化物膜(N型和P型)。这种行为可用于未来的神经形态计算,因为N型材料表现出抑制突触响应(随着时间/电压的增加),而p型材料表现出兴奋性突触响应(随时间/电压的阻力降低)。原则上(尚未证明)这种核心互补技术可以完全实现神经元/突触脑功能,而无需传统CMOS。

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