首页> 外文会议>Meeting of the Electrochemical Society >Design, Fabrication, Characterization, and Evaluation of X-ray Detectors Based on n-type 4H-SiC Epitaxial Layer
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Design, Fabrication, Characterization, and Evaluation of X-ray Detectors Based on n-type 4H-SiC Epitaxial Layer

机译:基于N型4HSIC外延层的X射线检测器的设计,制造,表征和评估

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The Schottky barrier diode (SBD) radiation detectors on n-type 4H-SiC epitaxial layer have been designed, fabricated, and evaluated for low energy x-rays detection. The detectors were found to be highly sensitive to x-ray flux in the 50 eV to few keV range and showed significantly improved response compared to the commercial of-the-shelf (COTS) SiC UV photodiodes. Thermally stimulated current (TSC) measurements performed in wide temperature range (94 - 550 K) revealed low density of deep level centers in the epitaxial layer. The high quality of the epitaxial layer was confirmed by XRD rocking curve measurements and defect delineating chemical etching. The detectors fabricated on 4H-SiC epitaxial layers exhibited low leakage current at 475 K (< 1 nA at 200 V) revealing great possibility of high temperature operation.
机译:设计,制造,并评估了N型4H-SIC外延层上的肖特基势垒二极管(SBD)辐射探测器,用于低能量X射线检测。发现探测器对50eV中的X射线通量高度敏感到少量KEV范围,并且与搁板(COTS)SiC UV光电二极管相比,响应显着改善。在宽温度范围(94-550k)中进行的热刺激电流(TSC)测量显示在外延层中的低密度的深层密度。通过XRD摇摆曲线测量和缺陷描绘化学蚀刻来确认外延层的高质量。在4H-SIC外延层上制造的探测器在475k(<1NA为200V)下显示出低漏电流,揭示了高温操作的巨大可能性。

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