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THE SAW PROPERTIES OF SPUTTERED SiO_(2) ON X-112°Y LiTaO_(3)

机译:溅射SiO_(2)的SAW属性在X-112°Y LiTaO_(3)上

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摘要

The surface acoustic wave (SAW) propagation properties on the X-cut plate, 112°Y rotated, lithium tantalate (LiTaO_(3)) substrate with and without sputtered SiO_(2) film layers have been investigated using interdigital transducer electrode structures. Thicknesses of SiO_(2) of 500 nm and 1000 nm were sputter deposited on the X-112°Y LiTaO_(3) substrates. A series array of aluminum electrode patterns deposited on the film facilitated the excitation of a wide frequency band of harmonic waves up to 2.0 GHz, and permitted delineation of SAW velocity and propagation loss characteristics for several values of film-thickness to acoustic-wavelength (t/λ) ratio. A resonator pattern at the substrate/film interface, permitted the capacitance ratio (C_(m)/C_(o)), related to coupling factor, and the temperature coefficient of frequency (TCF) to be measured. A high velocity pseudo-SAW (HVPSAW) mode was observed with a velocity near 6300 m/s.
机译:使用叉指式换能器电极结构研究了X切割板上的表面声波(SAW)旋转,112°Y旋转的锂钽酸盐(LiTaO_(3))衬底,具有溅射的SiO_(2)膜层。将500nm和1000nm的SiO_(2)的厚度溅射在X-112°Y LiTaO_(3)衬底上溅射。沉积在薄膜上的串联铝电极图案阵列促进了高达2.0GHz的宽频波宽频带的激励,并且允许扫描速度和传播损耗特性的逐个薄膜厚度值与声波长度(T /λ)比率。基板/膜界面处的谐振器图案允许与耦合因子相关的电容比(C_(M)/ C_(O))和待测量的频率温度系数(TCF)。观察到高速伪锯(HVPSAW)模式,其速度接近6300米/秒。

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