首页> 外文会议>The Meeting of the Electrochemical Society >FABRICATION OF SMOOTH LOW STRESS AMORPHOUS CARBON MICRO-STRUCTURES BY PHOTOLITHOGRAPHY AND WET KOH ETCHING
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FABRICATION OF SMOOTH LOW STRESS AMORPHOUS CARBON MICRO-STRUCTURES BY PHOTOLITHOGRAPHY AND WET KOH ETCHING

机译:通过光刻和湿式酸蚀刻制造光滑的低应力非晶碳微结构

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The amorphous carbon films prepared by filtered cathodic vacuum arc (FCVA) deposition system are superior in nature with very smooth surface morphology,relatively high hardness,exceptional tribological behaviour and excellent bio-compatibility [1].These exceptional qualities make them suitable for many device applications.However,these superior quality films prepared at relatively lower substrate bias such as -80V exhibits high compressive stress [1].
机译:通过过滤的阴极真空弧(FCVA)沉积系统制备的无定形碳膜本质上具有非常光滑的表面形态,具有相对高的硬度,具有出色的摩擦学行为和优异的生物兼容性[1]。这些卓越的品质使它们适用于许多设备但是,在相对较低的基板偏压下制备的这些优质薄膜,诸如-80V的较高的压缩应力[1]。

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