High dielectric Constant Thin Films in TiO2,BaO-TiO2,and BaO-SrO-TiO2 Systems via Photochemical Metal Organic Deposition (PMOD) Processes

摘要

The inclusion of metal oxides and mixed metal oxides possessing higher dielectric constants than more traditional insulators such as silicon oxide into microelectronic devices is currently an important topic in a variety of areas.The metal oxide deposition described in this work combines the ease ofspin-on processing and direct photo patterning of a organ ometallic precursor films to overcome a number of limitations encountered with other dielectric deposition methods.For example,the inclusion of embedded passive devices such as capacitors into printed wiring boards (PWB) is currently of considerable importance in the field of packaging technology for system-on-package (SOP) applications.