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Buffer layers for narrow bandgap A-sige solar cells

机译:用于窄带隙A-SiGe太阳能电池的缓冲层

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In high efficiency narrow bandgap (NBG) a-SiGe solar cells, thin buffer layers of unalloyed hydrogenated amorphous silicon (a-Si) are usually used at the interfaces between the a-SiGe intrinsic layer and the doped layers. We investigated theeffect of inserting additional a-SiGe interface layers between these a-Si buffer layers and the a-SiGe absorber layer. We found that such additional interface layers increase solar cell V{sub}(oc) and FF sizably, most likely due to the reduction orelimination of the abrupt bandgap discontinuity between the a-SiGe absorber layer and the a-Si buffer layers. With these improved narrow bandgap solar cells incorporated into the fabrication of triple-junction a-Si based solar cells, we obtained triplecells with initial efficiency of 10.6%.
机译:在高效率窄带隙(NBG)A-SiGe太阳能电池中,通常在A-SiGe固有层和掺杂层之间的界面处使用薄缓冲层的未合金化氢化非晶硅(A-Si)。我们调查了在这些A-Si缓冲层和A-SiGe吸收层之间插入附加的A-SiGe接口层的IFEFF。我们发现这种附加接口层增加了太阳能电池V {Sub}(OC)和FF,最有可能由于A-SiGe吸收层和A-Si缓冲层之间的突然带隙的不连续性的减少而导致的。通过这些改进的窄带隙太阳能电池,该太阳能电池掺入三结A-Si的太阳能电池的制造中,我们获得了初始效率为10.6%的Triplecells。

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