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Buffer layers for narrow bandgap a-SiGe solar cells

机译:窄带隙a-SiGe太阳能电池的缓冲层

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In high efficiency narrow bandgap (NBG) a-SiGe solar cells, thin buffer layers of unalloyed hydrogenated amorphous silicon (a-Si) are usually used at the interfaces between the a-SiGe intrinsic layer and the doped layers. We investigated the effect of inserting additional a-SiGe interface layers between these a-Si buffer layers and the a-SiGe absorber layer. We found that such additional interface layers increase solar cell V_(oc) and FF sizably, most likely due to the reduction or elimination of the abrupt bandgap discontinuity between the a-SiGe absorber layer and the a-Si buffer layers. With these improved narrow bandgap solar cells incorporated into the fabrication of triple-junction a-Si based solar cells, we obtained triple cells with initial efficiency of 10.6
机译:在高效窄带隙(NBG)a-SiGe太阳能电池中,通常在a-SiGe本征层和掺杂层之间的界面处使用非合金氢化非晶硅(a-Si)的薄缓冲层。我们研究了在这些a-Si缓冲层和a-SiGe吸收层之间插入其他a-SiGe界面层的效果。我们发现,这种额外的界面层相当大地增加了太阳能电池的V_(oc)和FF,这最有可能是由于减少了或消除了a-SiGe吸收层和a-Si缓冲层之间的突然带隙不连续。通过将这些改进的窄带隙太阳能电池并入三结a-Si基太阳能电池的制造中,我们获得了初始效率为10.6的三电池。

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