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Improved Dielectric Properties of Heterostructured Ba_0.5Sr_0.5TiO_3 Thin Fiml Composites for Microwave Dielectric Devices

机译:改进的介电性质的异质结构Ba_0.5SR_0.5TiO_3微波介质器件的薄FIML复合材料

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In the present work we have deposited MgO and Ba_0.5Sr_0.5TiO_3 (BST50) thin layers in different sequences to make MgO:BST50 hetero-structured thin films.These films wree characterized by X-ray diffraction and found to be highly (100) textured.The figure of merit [(C_0-C_v)/(C_(0·tandelta)} of the hetero-structured films was found to be higher as compared to pure BST50 films measured at 1 MHz frequency with electric field of 25.3 kV/cm.These films were used to make eight element coupled micro-strip phase shifter and characterized in a frequency range of 13-15 GHz.The hihg frequency figure of merit (kappa factor,defined as the ratio of degree of phase shift per dB loss) measured at around 14 GHz with electric field of 333 kV/cm has been markedly improved (around 64.28 deg/dB for hetero-structured film as compared to 24.65 deg/dB for pure film).Improvement in dielectric properties in a wide frequency range in the MgO:BST are believed to be due to the higher densification of the hetero-structured films.
机译:在本工作中,我们在不同序列中存放了MgO和Ba_0.5SR_0.5TIO_3(BST50)薄层制作MgO:BST50杂结构薄膜。这些薄膜涉及X射线衍射,并发现高度(100)织布性。杂结构化薄膜的优异[(C_0-C_V)/(C_(0·Tandelta)}与在1 MHz频率下测量的纯BST50薄膜相比,电场25.3 kV / CM。这些薄膜用于制造八个元素耦合微带移相器,其特征在于13-15GHz的频率范围内的频率范围内的频率范围(Kappa因子,定义为每DB损耗的相移程度的比率)在大约14GHz下测量的电场333kV / cm的电场已经显着改善(杂种结构薄膜约为64.28℃,与纯膜的24.65℃/ dB相比)。在宽频率范围内的介电性能下的实施例在MgO中:BST被认为是由于杂菌-S的致密化较高碎片薄膜。

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