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The Effects of Substrate Temperature and Bias on the Structural,Mechanical and Tribological Properties of TiC films deposited by Magnetron Assisted Pulsed Laser Deposition

机译:基板温度和偏置对磁控辅助脉冲激光沉积沉积的TIC膜结构,机械和摩擦学性能的影响

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Titanium carbide films have been deposited using a hybrid magnetron sputtering/pulsed laser deposition technique.One set of films was deposited at substrate temperatures ranging from room temperature to 600 deg C with no substrate bias,and a second set was deposited at 400 deg C bias voltages up to -150V.X-ray diffraction,X-ray photoelectron spectroscopy,and electron microscopy were employed for structural and compositional characterization of the films,and nano-indentation hardness testing and pin-on-disc wear tests were used to evaluate the mechanical and tribological properties.All the TiC films deposited without substrate bias were highly crystalline.The films deposited with bias had significantly reduced crystallinity and non-stoichiometric film compositions.The hardness of the TiC films increased with substrate temperature from 8 GPa at room temperature to 18 GPa at 600 deg C,whereas the biased films had a maximum hardness of 12 GPa.The wear test data showed significantly lower friction and longer wear life for the-150V biased film.
机译:使用混合磁控溅射/脉冲激光沉积技术沉积碳化钛膜。在从室温至600℃的基板温度下沉积一组薄膜,没有衬底偏压,并且在400°C偏压下沉积第二组高达-150V.x射线衍射,X射线光电子体光谱和电子显微镜用于薄膜的结构和组成表征,以及纳米凹部硬度测试和销钉磨损试验用于评估机械和摩擦学性能。沉积的没有底物偏压的TiC膜是高度结晶的。沉积偏置的膜具有显着降低的结​​晶度和非化学计量膜组合物。TIC膜的硬度随室温在室温下从8GPa增加到8GPa。在600℃下18GPa,而偏置薄膜的最大硬度为12 GPA。磨损测试数据显示出显着降低对-150V偏置薄膜的灵敏度和较长的磨损。

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