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Effect of Substrate Materials on Mechanical Properties and Microstructure of Carbon Nitride Films Prepared by Ion-beam-assisted deposition

机译:基材材料对离子梁辅助沉积制备的碳氮化膜力学性能和微观结构的影响

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Carbon nitride (C-N) thin films were prepared on several substrates by ion-beam-assisted deposition technique. In this experiment, carbon was evaporated by electron beam. Nitrogen and argon ion beams were bombarded simultaneously. Aluminum alloy (7075), high-carbon chrome bearing steel (SUJ2), pure titanium plates (99.5 percent) and Si(100) wafer were used as substrates. Here, mechanical properties, such as hardness, adhesion, friction coefficient and wear resistance were investigated. These results show the adhesion between the films and substrates were improved by formation of the carbon layer. The microstructure of the carbon nitride films were investigated by cross sectional high-resolution transmission electron microscopy (HRTEM).
机译:通过离子束辅助沉积技术在几个基板上制备氮化碳(C-N)薄膜。在该实验中,通过电子束蒸发碳。同时轰击氮和氩离子束。铝合金(7075),高碳铬轴承钢(SUJ2),纯钛板(99.5%)和Si(100)晶片用作基材。这里,研究了诸如硬度,附着力,摩擦系数和耐磨性的机械性能。这些结果表明通过形成碳层改善了薄膜和基材之间的粘附性。通过横截面高分辨率透射电子显微镜(HRTEM)研究了碳氮化物膜的微观结构。

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