FILM DEPOSITION METHOD OF BORON-CARBON NITRIDE AND BORON NITRIDE, AND FILM, SUBSTRATE AND DEVICE OBTAINED BY THE METHOD

摘要

PROBLEM TO BE SOLVED: To provide a flexible organic material substrate, a glass substrate or the like with boron-carbon nitride and boron nitride being film-deposited by performing the film deposition of boron-carbon nitride and boron nitride at the temperature of below 250°C at which a substrate formed of a flexible organic material, a glass-made substrate or the like can withstand.;SOLUTION: In the film deposition method of boron-carbon nitride, plasma is generated in a film deposition chamber to mainly excite nitrogen atoms, the excited nitrogen atoms are reacted with boron atoms and carbon atoms to perform the film deposition of boron-carbon nitride on a substrate, a film deposition promoting substance layer consisting of metal is formed on the substrate in advance. The film deposition promoting substance layer is formed of a substance containing any one of iron, titanium, nickel, platinum, chromium and cobalt.;COPYRIGHT: (C)2007,JPO&INPIT