Effects of substrates roughness on c-axis preferred orientation of ZnO films deposited by rf magnetron sputtering

摘要

We investigated the effect of substrate surface roughness on c-axis preferred orientation of ZnO films deposited by radio frequency (rf) magnetron sputtering. We used as substrates a bare Si(100), evaporated Au/Si(100), evaporated A1/Si(100), and sputtered Al/Si(100), of which rms roughness by atomic force microscope (AFM) were 0.127, 1.71, 2.11, and 6.5～11.8 nm, respectively. The crystallinity and the c-axis preferred orientation of ZnO films strongly depended on the surface roughness of the used substrates.