We describe how focused ion beam (FIB) direct write technology may be combined with microcontact printing (μCP) and other pattern transfer techniques to enable nanoscale fabrication of complex patterns over both curved and planar surfaces. Nanoscale printheads are fabricated by direct sputtering or deposition (Pt or SiO{sub}2) in the FIB. These printheads are capable of transferring 100 nm features over fields of view up to 1 mm{sup}2, onto planar and curved surfaces. We are also investigating the concept of “programmable” printheads by fabrication of individually addressable printhead arrays, coupled with selective desorption of a relevant transfer medium (e.g. hexadecanethiol self-assembled monolayers) by heating or by application of an electric field.
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机译：我们描述了聚焦离子束（FIB）直接写入技术如何与微接触印刷（μCP）和其他图案传递技术相结合，以使纳米级制造在两个弯曲和平面表面上方的复杂图案。纳米级打印头通过FIB中的直接溅射或沉积（Pt或SiO {sub} 2）制造。这些打印头能够将100nm的特征传递到高达1 mm {sup} 2的视野，到平面和弯曲的表面上。我们还通过制造可单独寻址的打印头阵列来调查“可编程”打印头的概念，通过加热或通过施加电场，加上相关的传递介质（例如十六烷硫醇自组装单层）的选择性解吸。
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