Laser flash photolysis study of some N-oxysuccinimidosulfonate photoacid generators.Potential photoacid generators for 193 nm lithography

摘要

The role of photoacid generators is of primary importance in the field of microlithography,particularly as far as applications in microelectronics are concerned.In fact the design of high sensitivity resists requires the use of suitable molecules in order to improve the quantum efficiency of the processes.