PHOTOACID GENERATOR, PHOTORESIST CONTAINING THIS PHOTOACID GENERATOR, AND COATED ARTICLE CONTAINING THE SAME

摘要

To provide a photoacid generator for 193-nm lithography, which exhibits improved resolution and defect control.SOLUTION: The invention provides a photoacid generator having an anionic component with an acetal or ketal protected polyhydroxy group attached, such as formula (III-a) in the figure, represented by (triphenylsulfonium 1,1-difluoro-2-oxo-2-((2,2,6a-trimethyl-6-oxotetrahydrofuro[3,4-d][1,3]dioxol-4-yl)methoxy)ethanesulfonate.SELECTED DRAWING: None