首页> 外文会议>Symposium on chemical aspects of electronic ceramics processing >EFFECT OF PRECURSORS AND STACKING STRUCTURES ON CRYSTALLIZATION OF MULTI-LAYERED LEAD ZIRCONATE TITANATE THIN FILMS BY SOL-GEL METHOD
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EFFECT OF PRECURSORS AND STACKING STRUCTURES ON CRYSTALLIZATION OF MULTI-LAYERED LEAD ZIRCONATE TITANATE THIN FILMS BY SOL-GEL METHOD

机译:前体和堆积结构对溶胶 - 凝胶法结晶多层锆钛晶膜结晶的影响

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Ferroelectric lead zirconate titanate, Pb(Zr_xTi_(1-x))O_3 (hereafter abbreviated as PZT), thin films were prepared by annealing precursor films of multilayered structures composed of alternating layers of PZT and lead titanate (hereafter abbreviated as PT). This method (which we refer to as multi-seeding) was used in order to lower the processing temperature of PZT. The precursor films were prepared from alkoxide precursor solutions. Effects of zirconium to titanium ratios and stacking structures of the multi-layered precursor films on crystallization behavior were studied to improve the electrical properties of the resultant PZT thin films. Layers of PT were inserted between every PZT layer in order to seed the crystallization of the desired perovskite phase. PT has previously been shown to crystallize with a pure perovskite structure at temperatures as low as 450 deg C. Precursor layers of PZT with different compositions, ranging from x=1 to x=0.53 were prepared. In this process, the compositions of the PZT precursors and/or the stacking structure, as well as the heating schedule, had a large effect on the crystallization behavior. Nucleation control of the PT seeding layer by changing the heating schedules played an important role in preparing perovskite PZT thin films at low temperatures. Dielectric properties of the resultant films depended on the compositions and annealing temperatures. It was demonstrated that the composition of the resultant PZT film was controllable in the multi-seeding process, and that dielectric properties of the resultant films were improved.
机译:铁电锆钛酸铅,铅(Zr_xTi_(1-X))O_3(以下简称为PZT),通过退火PZT和钛酸铅(以下简称为PT)的交替层构成的多层结构的前体膜制备薄膜。该方法(我们称之为多播种)为了降低PZT的处理温度使用。将前体膜从醇盐前体溶液制备。进行了研究,以改善所得PZT薄膜的电特性的锆与钛的比率和对结晶行为的多层前体薄膜的层叠结构的影响。 PT的层以种子所需的钙钛矿相的结晶化每PZT层之间插入。 PT先前已经显示在温度与纯钙钛矿结构的结晶低至PZT的450℃。前体层具有不同组成的,其范围从x = 1到x制备= 0.53。在这个过程中,前体PZT和/或层叠结构的组合物,以及作为加热时间表,对结晶行为有很大影响。该PT通过改变加热时间表播种层的成核控制在低温下制备钙钛矿的PZT薄膜中发挥了重要的作用。取决于组合物和退火温度所得到的薄膜的介电性能。已经证实,将所得PZT膜的组成为在多播过程可控的,并且所得的膜的该介电性能得到改善。

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