首页> 外文期刊>Journal of Sol-Gel Science and Technology >Microstructure and electrical properties of lead zirconate titanate thin films deposited by sol-gel method on La0.7Sr0.3MnO3/SiO2/Si substrate
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Microstructure and electrical properties of lead zirconate titanate thin films deposited by sol-gel method on La0.7Sr0.3MnO3/SiO2/Si substrate

机译:溶胶-凝胶法在La0.7 Sr0.3 MnO3 / SiO2 / Si衬底上沉积钛酸锆酸铅薄膜的微观结构和电学性能

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摘要

(La0.7Sr0.3)MnO3 thin films were deposited on SiO2/Si substrates by a metal-organic decomposition (MOD) method, and then Pb(Zr0.52Ti0.48)O3 (PZT) thin films were grown on (La0.7Sr0.3)MnO3-coated SiO2/Si substrates by a sol-gel method. The effects of annealing temperature on the crystalline phases, microstructures and electrical properties of the PZT films were investigated. X-ray diffraction analysis results indicated that the PZT films with a perovskite single phase could be obtained by annealing at 650°C. The dielectric constant and the remnant polarization of the PZT films increased with increasing annealing temperature. The remnant polarization and the coercive field of the films annealed at 650°C were 18.3 μC/cm2 and 35.5 kV/cm, respectively, whereas the dielectric constant and loss value measured at 1 kHz were approximately 1100 and 0.81, respectively.
机译:采用金属有机分解法将(La0.7 Sr0.3 )MnO3 薄膜沉积在SiO2 / Si衬底上,然后沉积Pb(Zr0)。在(La0.7 Sr0.3 )MnO3 涂层上生长.52 Ti0.48 )O3 (PZT)薄膜SiO2 / Si衬底的溶胶-凝胶法。研究了退火温度对PZT薄膜的晶相,微观结构和电性能的影响。 X射线衍射分析结果表明,可以通过在650℃下退火获得具有钙钛矿单相的PZT膜。随着退火温度的升高,PZT薄膜的介电常数和剩余极化率增加。在650°C退火的薄膜的残余极化和矫顽场分别为18.3μC/ cm2和35.5 kV / cm,而在1 kHz下测得的介电常数和损耗值分别约为1100和0.81 。

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