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Beyond-the-roadmap technology: silicon heterojunctions, optoelectronics, and quantum devices

机译:超越路线图技术:硅杂功能,光电子和量子装置

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The roadmap for silicon device technology has been drawn,extending to the year 2010, and featuring a CMOS transistor will a gate length of 0.07 um m [1]. Beyond this point, silicon heterojunctions could provide a means to further device scaling. Silicon heterojunctions could also bring new devices to the silicon substrate including light emitters and detectors, and resonant tunneling diodes (RTDs). Today SiGe/Si and SiGeC/Si heterojunctions are receiving the greatest attention, but heterojunctions now being developed to realize silicon RTDs are increasing the heterojunction options for silicon-based quantum-well and optical devices. Here we outline the fundamental device requirements for silicon optical and tunneling devices and describe progress on silicon heterojunction development towards demonstration of silicon-based RTDs. Materials now under study inlcude, ZnS, crystalline oxides and nitrides; new processes could provide mehtods for forming crystalline materials over amorphous barriers.
机译:已经绘制了硅装置技术的路线图,延伸到2010年,并以CMOS晶体管为特色,将栅极长度为0.07μmm [1]。除此之外,硅杂交功能可以提供进一步设备缩放的方法。硅杂交功能还可以将新器件带到硅衬底,包括光发射器和探测器,以及谐振隧道二极管(RTD)。如今,SiGe / Si和Sigec / Si异质杂志正在接受最大的关注,但现在正在开发的异质功能以实现硅RTDS正在增加基于硅的量子阱和光学装置的异质结选口。在这里,我们概述了硅光学和隧道设备的基本设备要求,并描述了硅的差异开发的进展,以便在基于硅基RTDS的演示。目前正在研究的材料inlcude,ZnS,结晶氧化物和氮化物;新方法可以为MeHtod提供以在非晶屏障上形成晶体材料。

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