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LiCoO_2 thin films grown by pulsed laser deposition on low cost substrates

机译:LiCoO_2通过脉冲激光沉积在低成本基板上生长的薄膜

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摘要

We report on the use of pulsed laser deposition (PLD) to grow thin films lf LiCOO_2 on a number of low cost substrates including SnO_2 coated Upliex, stainless steel and SnO_2 coated glass. Highly textured (001) films grown on CVD deposited SnO_2 films on 7059 glass were obtained at 200 to 500 mTorr O_2 and a temperature of 500 C. Similar texture was not obtained on the stainless or Upilex however dense films from crystalline to amorphous were obtained. The films were characterized y x-ray diffraction and Raman spectroscopy.
机译:我们报告使用脉冲激光沉积(PLD)在包括SNO_2涂层UPLIEX,不锈钢和SNO_2涂层玻璃的多个低成本基板上生长薄膜LF LICOO_2。在CVD沉积的SnO_2薄膜上生长的高度纹理(001)薄膜在7059玻璃上获得200至500 mtorr O_2,温度为500℃。在不锈钢或富集中未获得相似的质地,但是从结晶到无定形的致密膜。薄膜的表征为Y X射线衍射和拉曼光谱。

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