Chalcogenide inorganic resists as holographic recording media

摘要

In present paper the utilization of the two types of inorganic resist: Ag-chalcogenide glass (ChG) structures and thin ChG layers for holograms recording is discussed. The optical characteristics and photographic properties of these materials were investigated, the study of hologram relief formation in ChG-Ag and ChG layers have been made. Among the investigated ChG layers the As$-40$/S$-20$/Se$-40$/ have shown the most optimal characteristics for the hologram recording. Good mechanical strength and thermostability of ChG layers enabled to use the obtained phase relief holograms after additional treatment for the production thermo- or photopolymer copies, or galvanic nickel deposition. The high quality polymer copies and nickel matrixes for mass production were obtained from the chalcogenide based master holograms. Characteristics of the obtained phase-relief holograms and their copies were investigated.