An Ultrasensitive Electron (Soft X-Ray) Silver Halide/Chalcogenide Negative or Positive Inorganic Resist

摘要

We have successfully Ag-photodoped As2S3 using photographic Ag derived from evaporated AgBr. The use of evaporated AgBr has resulted in a 1000-fold increase in speed. We have shown that evaporated AgBr has very high sensitivity in the deep UV (50 microJ/cm2 at 2600 angstrnoms), at soft x-ray wavelengths (5 microJ/cm2 at 7 angstrnoms) and confirmed the previously observed e-beam sensitivity of 10-9 coulombs/cm2. We have shown the feasibility of using evaporated AgBr as the photon sensitive layer of a multi-layer photoresist system for submicron lithography. (Author)