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Computational study of two nonvolatile recording media: resistive random access memory (RRAM) and graded magnetic media.

机译:两种非易失性记录介质的计算研究:电阻式随机存取存储器(RRAM)和分级磁介质。

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摘要

The role of nonvolatile memories in recording devices has become extremely important in modern times. Various nonvolatile memory (NVM) concepts have been researched. Some of them have been successfully applied for memory devices: e.g. magnetic hard disk and flash memory. Other NVM concepts are actively researched for possible applications in the future: ferroelectric random access memory (FeRAM), magnetic RAM (MRAM) and resistance RAM (RRAM). Both mature NVM technologies and early stage NVM concepts have their own challenges. In the mature hard disk industry, it has become increasingly difficult to further increase the recording density. On the other hand, for one promising concept, RRAM, researchers are still searching for the dominant physical cause of experimentally observed electrically switching resistance states. These two problems are the focus of this work.;We used software simulators that incorporate necessary physical interactions to duplicate the studied materials: transitional metal oxide in between metallic electrodes in the RRAM study and perpendicular magnetic grain for the magnetic media study.;Using the RRAM simulator, we identified oxygen vacancies in the interface layer next to the electrode as the main driver of the switching behavior. Using the magnetic media simulator, we found that a perpendicular column with the anisotropy constant varying quadratically with its height and a hard layer on the top has the optimal recording characteristic (high energy barrier and low coercivity) for a high density media.
机译:非易失性存储器在记录设备中的作用在现代已变得非常重要。已经研究了各种非易失性存储器(NVM)的概念。其中一些已成功应用于存储设备:磁性硬盘和闪存。其他NVM概念也在积极研究中,以备将来应用:铁电随机存取存储器(FeRAM),磁性RAM(MRAM)和电阻RAM(RRAM)。成熟的NVM技术和早期NVM概念都有其自身的挑战。在成熟的硬盘工业中,进一步增加记录密度变得越来越困难。另一方面,对于一个有前途的概念,RRAM,研究人员仍在寻找实验观察到的电开关电阻状态的主要物理原因。这两个问题是这项工作的重点。;我们使用了包含必要的物理相互作用的软件模拟器来复制研究的材料:RRAM研究中的金属电极之间的过渡金属氧化物和磁性介质研究中的垂直磁性晶粒。通过RRAM仿真器,我们确定了电极旁边的界面层中的氧空位是开关行为的主要驱动力。使用磁介质模拟器,我们发现各向异性常数随高度成二次方变化且顶部为硬层的垂直柱具有高密度介质的最佳记录特性(高能垒和低矫顽力)。

著录项

  • 作者

    Shin, Duk Kun.;

  • 作者单位

    University of California, Davis.;

  • 授予单位 University of California, Davis.;
  • 学科 Physics General.;Physics Electricity and Magnetism.
  • 学位 Ph.D.
  • 年度 2012
  • 页码 109 p.
  • 总页数 109
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-17 11:42:42

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