Optimization of chamber clean process for AMAT 5200 DCVD centura lamp heated teos process

摘要

This paper provides measure-ment results from a standard C_2F_6 PECVD chamber clean process, screen tests and DOE by varying C_2F_6 flow rates, pressure, and C_2F_6 and oxygen ratios. The relationship between these variables is modeled for clean times and emissions.