Influence of Substrate Temperature and Plasma Power Density on the Properties of Plasma-Assisted Chemical Vapour Deposited Titanium Nitride

摘要

Titanium nitride films deposited onto high speed steel substrates by plasma-assisted chemical vapour deposition (PACVD) from TiCl{sub}4, H{sub}2, N{sub}2, and Ar gas mixtures have been investigated. The substrate temperature was varied between 250 and 550°C via the plasma power density or via an additional electrical heater. The influence of temperature and plasma power density on the morphology, chemical composition, hardness and adhesion of the coatings was studied. At a temperature of 500°C different plasma power densities caused changes of the morphology of the coatings. At low plasma power densities fine grained polycrystalline layers were observed. A significant change from coarse to fine grained structures was also observed with decreasing deposition temperature. Scratch test results indicate that coatings deposited at a given substrate temperature with lower plasma power density showed increased values of the critical load.