Ultrathin film growth of vanadyl phthalocyanine was attempted on vicinal surfaces of hydrogen-terminated Si(111) in order to see the effect of regularly spaced steps to the growth feature. It has been obserdved that molecular arrangement was substantially affected when the terrace width was narrower than 2 approx 4 times of the molecular lattice constants. This result is probably due to the weaknessof molecular interaction in the material and it accounts for the reason why ordinary graphoepitaxy has not been successful for the organic thin films.
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