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New applications of cross-talk-based capacitance measurements CMOS ICs

机译:基于串扰的电容测量的新应用CMOS IC

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Charge-based capacitance measurements (CBCMs) are widely used to estimate on-chip wiring capacitances because of their accuracy and simplicity. Enhanced CMOS transducers for CBCM have been recently proposed that exploit cross-talk to selectively measure cross-coupling capacitances. In this paper, we propose two new applications of cross-talk-based capacitance measurements: mismatch measurement of stacked metal-metal capacitor pairs, and localization of wire interruptions. We present the measurement techniques, we discuss their implementation and we report preliminary experimental results.
机译:基于电荷的电容测量(CBCMS)被广泛用于估计片上布线电容,因为它们的准确性和简单性。最近已经提出了用于CBCM的增强CMOS传感器,从而利用串扰以选择性地测量交叉耦合电容。在本文中,我们提出了两个基于串扰的电容测量的新应用:堆叠金属 - 金属电容器对的不匹配测量,以及线中断的定位。我们展示了测量技术,我们讨论了他们的实施,我们报告了初步实验结果。

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