Silicon oxynitride (SiO/sub x/N/sub y/) thin films were deposited on silicon substrates by low pressure chemical vapour deposition. The influence of the temperature and of the relative gas flow rate ratio (N/sub 2/O/NH/sub 3/) on the optical characteristics (using ellipsometry) and composition (using Bruggeman effective medium approximation) of the SiO/sub x/N/sub y/ films was analysed. It has been demonstrated that SiO/sub x/N/sub y/ films have good characteristics such as uniformity, reproducibility and offer an excellent control of refractive index and can be used for optical waveguide applications and membranes with mechanically controlled stress.
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机译：通过低压化学气相沉积在硅基板上沉积氧氮化硅（SiO / Sub X / N / Sub Y /）薄膜。温度和相对气体流速比的影响（相对气体流速比（N / SUB 2 / O / NH / SUB 3 /）在光学特性（使用椭圆形测量）和组成（使用Brugmeman有效介质近似）的SiO / Sub x / n /亚y /薄膜被分析。已经证明，SiO / Sub X / N / Sub Y /薄膜具有良好的特性，例如均匀性，再现性，并且提供了对折射率的优异控制，并且可用于光波导应用和具有机械控制应力的膜。
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