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Growth of 105k(BiPb)2Sr2Ca2Cu3O10 films on MgO by the pulsed laser deposition technique

机译:脉冲激光沉积技术的105K(BIPB)2SR2CA2CU3O10在MgO上生长

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To compensate for the loss of Pb during the preparation of BiSrCaCuO films we have deposited layers of PbO as part of a multilayer sandwich structure with BiPbSrCaCuO using the pulsed laser deposition technique. We have carefully optimized three parameters, namely the substrate temperature, post annealing temperature, and post annealing duration in order to produce the highest content of the 2223 phase in the films. By using a substrate temperature of 250$DGR@C and ex-situ annealing at 854$DGR@C for 15 hours in air we have produced highly c-axis oriented films which comprises some 95% 2223. These films typically exhibit T$-c$/ values of 105.5 K with associated critical current density of 2.5 $MUL 10$+4$/ A/Cm$+2$/ at 70 K.
机译:为了补偿在Bisrcacuo薄膜的制备过程中Pb的损失,我们使用脉冲激光沉积技术将PBO层沉积为多层夹心结构的一部分。我们已经精心地优化了三个参数,即衬底温度,后退火温度,并在薄膜中产生最高含量的2223相的最高含量。通过使用250美元DGR @ C和Ex-Betr @ C的衬底温度,在854 $ @ C的空气中,我们产生了高度的C轴导向薄膜,其中包括约95%2223.这些薄膜通常展示T $ - C $ /值105.5 k,相关临界电流密度为2.5 $ + 4 $ / a / cm $ + 2 $ / at 70 k。

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