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Modification of heterojunction band offsets at III-V/IV/III-V interfaces

机译:III-V / IV / III-V接口的异质结带偏移的修改

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摘要

We summarize here a systematic investigation of the structural and electronic properties of III-V/IV semiconductor heterojunctions (with IV $EQ Si, Ge, and III-V $EQ GaAs, AlAs) as well as III-V/IV/III-V single and multiple quantum well structures. All structures were fabricated by molecular beam epitaxy and characterized in-situ by reflection high energy electron diffraction and x-ray photoemission spectroscopy, and ex-situ by x-ray diffraction and transmission electron microscopy. We found that relatively abrupt composition profiles and ideal pseudomorphic growth could be achieved through appropriate deposition conditions. Measurements of the band discontinuities indicated that large deviations from the commutativity and transitivity rules of heterojunction band offsets are observed in most of these interfaces. Such deviations demonstrate the dependence of the band discontinuities on the local interface environment and are related, in general, to the establishment of inequivalent local interface environments.
机译:我们总结了本发明的系统性调查III-V / IV半导体异质结的结构和电子特性(IV $ EQ SI,GE和III-V $ EQ GAAS,ALAS)以及III-V / IV / III- v单个和多量子阱结构。通过反射高能电子衍射和X射线照相光谱和X射线衍射和透射电子显微镜,通过反射高能量电子衍射和X射线光谱和透射电子显微镜来表征所有结构。我们发现通过适当的沉积条件可以实现比较突出的组合物简档和理想的假形同样生长。频带不连续的测量表明,在大多数这些接口中观察到与异质结偏移偏移的换向和传递规则的大偏差。这种偏差展示了频段不连续性对本地接口环境的依赖性,并且通常是建立不等式的本地接口环境。

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