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Method of thin film thickness and constants measurement by surface plasmons excitation

机译:薄膜厚度和常数测量的方法通过表面等离子体激励

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摘要

The method of thin foil thickness and optical constants' simultaneous determination is proposed. These parameters are found by measurement of the light incidence angle in the attenuated total reflection (ATR) geometry corresponding to zero reflection (ZR) for different dielectric coatings on the ATR-prism base. Recently the excitation of surface plasmons (SP) by ATR has been applied to the investigation of surfaces of solid and thin films. The advantage of this method is the high sensitivity of SP to the surface state. Unlike the ellipsometry, the ATR method requires no phase difference measurement that essentially facilitates the measurement procedure. Two main schemes of the ATR method are that of Otto and of Kretchman. The scheme of Otto allows the investigation of a wider class of objects than that of Kretchman, but its application is dependent on the precise determination and control of the gap between the prism and the sample. For the solution of this problem, an elegant approach was suggested of finding values of the gap and the angle of the light incidence on the prism where the reflection coefficient equals zero. Thus the parameter to be measured is the light incidence angle. In this work, the analysis of measurement accuracy for film thickness and optical constants by the ATR ZR method is carried out and a new method is suggested allowing considerably more accuracy.
机译:提出了薄箔厚度和光学常数的同时测定的方法。通过对应于ATR - 棱镜基底的不同介电涂层对应于对应于零反射(Zr)的衰减的总反射(ATR)几何形状中的光入射角来找到这些参数。最近,通过ATR的表面等离子体(SP)的激发应用于固体和薄膜表面的研究。该方法的优点是SP到表面状态的高灵敏度。与椭圆测定法不同,ATR方法不需要基本上有助于测量过程的相位差测量。 ATR方法的两种主要方案是奥托和Kretchman的主要方案。奥托的方案允许调查比Kroetchman更广泛的物体,但其应用取决于精确的确定和控制棱镜和样品之间的间隙。对于解决这个问题的解决方案,提出了一种优雅的方法,对反射系数等于零的棱镜上的棱镜上的光射率和光入射角的角度。因此,要测量的参数是光入射角。在这项工作中,进行了ATR ZR方法的膜厚度和光学常数的测量精度分析,并建议允许更精确的方法。

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