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Characterization of hydrogenated amorphous silicon carbide films

机译:氢化非晶碳化硅膜的表征

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摘要

A-SiC:H films were prepared by magnetron sputtering of silicon in an atmosphere of argon, hydrogen and acetylene gas on c-Si and glass substrates maintained at a temperature of 250$DGR@C. It was indicated from the FTIR spectroscopy that the vibrational modes of SiC- and SiHm-shifted to higher energies due to the incorporation of carbon in a-Si:H network. The decrease of dark and photo conductivity with the carbon content was attributed to the additional defects produced by alloying of carbon in the a-Si:H.
机译:A-SiC:H膜通过硅溅射在C-Si和玻璃基板上的氩气氛,氢气和乙炔气氛中的磁阻溅射制备,保持在250美元DGR @ C的温度。从FTIR光谱表明,由于在A-Si网络中掺入碳,SiC和SiHM转移到更高的能量的振动模式。与碳含量的暗和光电率的降低归因于A-Si:h中碳的合金化产生的附加缺陷。

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