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Dc and ac conductivity of amorphous CuInTe2 thin films

机译:无定形Cuinte2薄膜的DC和AC电导率

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Dc and ac conductivity studies were made on a-CuInTe$-2$/ thin films deposited onto substrates held at liquid nitrogen temperatures. The dc results may be understood in terms of three modes of current paths, viz., hopping of carriers near the valence band tail, near an acceptor induced defect state and near the Fermi level at appropriate temperature ranges. A reasonable fit to the ac loss data could be made using the extended pair approximation due to Summerfield. Dc conductivity measurements were made using a two probe gap cell configuration. Thick Cu/In strips with well-defined parallel edges were deposited on the sample for electrical contacts. Film thicknesses ranged from 1500 to 6000 A. One electrode of the film was connected to a constant dc voltage source, and the other electrode was grounded through a Keithley 610 electrometer. The applied voltage was 5 V (corresponding to a field of 5 Vcm$+$MIN@1$/), which was well within the ohmic region of the film's I -V characteristics in the temperature region scanned. Cooling and warming up rates used in the measurements were of the order of 0.3 deg min$+$MIN@1$/. The current noise was below 10$+$MIN@15$/ A and the drift of the electrometer during the experiment was checked periodically. As deposited, all the films were p-type in nature as envisaged by the hot probe method.
机译:在沉积在液氮温度下的基材上的A-Cuinte $ -2 $ /薄膜上进行DC和AC电导率研究。可以以三种电流路径,viz模式来理解DC结果,从而在价带尾部附近的载流子,接近受体诱导缺陷状态,在适当的温度范围内接近费米水平。可以使用由于Simberfield引起的扩展对近似来实现对交流损耗数据的合理拟合。使用两个探针间隙电池配置进行直流电导率测量。沉积具有明确定义的平行边缘的厚Cu /条带沉积在样品上以进行电触点。膜厚度范围为1500至6000A。将薄膜的一个电极连接到恒定的DC电压源,另一个电极通过Keithley 610电计接地。施加的电压为5 V(对应于5 VCM $ + $ MIN @ 1 $ /),这在扫描温度区域的电影的I -V特性的欧姆区域内很好。测量中使用的冷却和预热率为0.3°Cin $ + $ min @ 1 $ /。当前噪声低于10 $ + $ MIN @ 15 $ / a,并且定期检查在实验期间的静电计漂移。沉积时,通过热探针方法设想,所有薄膜都是p型的。

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