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Optical exposure systems for three-dimensional fabrication of microprobe

机译:微探针三维制造的光学曝光系统

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New optical exposure systems for patterning on nonplanar surfaces were developed. One of them is the photoresist exposure system; the other is the Parylene laser ablation system with KrF excimer laser. Microprobe multielectrodes for recording neuron impulses were fabricated with the photoresist exposure system. However, this method has the disadvantage that it is difficult to coat a nonplanar surface with photoresist uniformly. It is demonstrated that Parylene can be coated uniformly on a nonplanar surface and be patterned by a Parylene laser ablation system. A Cr line with a 10 mu m width on a glass plate was patterned by Parylene laser ablation and the subsequent lift-off technique. This process is useful for patterning thin film on nonplanar surfaces.
机译:开发了用于图案化的新光学曝光系统。其中一个是光致抗蚀剂曝光系统;另一个是具有KRF准分子激光器的聚偶烯激光烧蚀系统。用于记录神经元脉冲的微探针多电极用光致抗蚀剂曝光系统制造。然而,该方法具有缺点:难以均匀地用光致抗蚀剂涂覆非平面表面。结果证明,聚对酰甲烯可以均匀地涂覆在非平面表面上,并由聚对二甲苯激光烧蚀系统图案化。通过聚对二甲苯激光烧蚀和随后的剥离技术,图案化了具有10μm宽度的Cr线。该过程可用于在非平面表面上进行图案化薄膜。

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