All-optical fabrication of three-dimensional photonic crystals in photopolymers by multiplex-exposure holographic recording

摘要

We develop holographic recording techniques for the versatile fabrication of three-dimensional (3D) photonic crystals in photopolymers. We introduce multiplex exposure schemes to overcome the restrictions of four-beam holographic lithography. A three-step exposure process makes it possible to fabricate hexagonal structures with three independent lattice constants. 3D photonic crystals with arbitrary geometry can be created by holographic multiplexing. Next, we extend the holographic lithography to six-beam interference to enable further design flexibility. Thick samples of different photopolymer systems are used for fabricating large-area 3D crystals. Structural properties of the fabricated crystals are investigated in a confocal laser scan setup.