首页> 外国专利> Zero-alignment method for tunable fabrication of three-dimensional photonic crystals by multiple-exposure laser interference using diffraction gratings patterned on a single mask

Zero-alignment method for tunable fabrication of three-dimensional photonic crystals by multiple-exposure laser interference using diffraction gratings patterned on a single mask

机译:使用单掩模上构图的衍射光栅通过多重曝光激光干涉可调谐制造三维光子晶体的零对准方法

摘要

A method for fabricating three-dimensional photonic crystal structures includes providing a layer of photosensitive material; introducing a laser beams into the material; reintroducing the laser beams into the photosensitive material during a second exposure; combining results from at least the first and second exposures to produce a three-dimensionally periodic pattern in the photosensitive material. A related system includes a laser source; a grating array having a plurality of diffraction gratings located thereon; a mask plate located on a photoresist layer and arranged in registration with the grating array; a rotating shutter arranged between the grating array and the laser source, said rotating shutter being suitable for periodically blocking light from the laser source; wherein each of the diffraction gratings is positioned and oriented so as to converge all first-order diffracted spots to a common point lying in a plane of a back side of the mask plate.
机译:一种制造三维光子晶体结构的方法,包括提供一层光敏材料。将激光束引入材料;在第二次曝光期间将激光束重新引入光敏材料中;结合至少第一和第二曝光的结果以在光敏材料中产生三维周期性图案。相关系统包括激光源。光栅阵列,其上具有多个衍射光栅;位于光致抗蚀剂层上并与光栅阵列对准布置的掩模板;旋转光栅,设置在光栅阵列和激光源之间,所述旋转光栅适于周期性地阻挡来自激光源的光;其中,每个衍射光栅被定位和定向为将所有一阶衍射点会聚到位于掩模板的背面的平面中的公共点。

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