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Rapid fabrication of two- and three-dimensional photonic crystals using multiple-exposure of two-beam interference pattern technique

机译:使用双光束干涉图样多次曝光技术快速制造二维和三维光子晶体

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摘要

A simple optical interference method for fabricating two- and three-dimensional (2D and 3D) periodical structures is theoretically and experimentally demonstrated. Multiple-exposure of two-beam interference pattern into a photopolymerizable resist creates high quality 2D or 3D microstructures. The type of periodic structure depends on the orientation of the photoresist with respect to the laser beams and the number of exposure. Square or hexagonal structures are obtained by choosing an angle of 90° or 60°, respectively, between two different exposures. 2D structures are obtained with two or three equal exposures. 3D structures with different types (bcc, fcc, Woodpile, etc.) are obtained with three or four exposures and appropriate rotation angles. This method presents many advantages over others using multi-beam (three-, four-, or five-beam) interference: ⅰ) easy to fabricate different structures (hexagonal or square) by simply rotating the sample, ⅱ) best contrast between the minimal and maximal intensities of interference pattern due to the identical polarization of two laser beams in the interference area, ⅲ) in particular, 3D periodical structures have the same period in three dimensions, which can't be obtained by one exposure of multi-beam interference. The experimental results obtained with SU-8 negative photoresist are well in agreement with the theoretical predictions. Such fabrication technique can be useful for applications in photonic crystals research.
机译:理论上和实验上证明了一种简单的光学干涉方法,用于制造二维和三维(2D和3D)期刊结构。将两束干涉图案多次曝光到可光致聚合的抗蚀剂中,可产生高质量的2D或3D微结构。周期性结构的类型取决于光致抗蚀剂相对于激光束的取向和曝光次数。通过在两个不同的曝光之间分别选择90°或60°的角度可获得正方形或六边形结构。通过两次或三个相等的曝光获得2D结构。通过三个或四个曝光和适当的旋转角度,可以获得具有不同类型(bcc,fcc,Woodpile等)的3D结构。与使用多光束(三光束,四光束或五光束)干涉的方法相比,该方法具有许多优势:ⅰ)只需旋转样品即可轻松制造不同的结构(六边形或正方形),ⅱ)最小之间的最佳对比度特别是3D周期性结构在三个维度上具有相同的周期,这是一次曝光多光束干扰所无法获得的,尤其是由于干涉区域中两个激光束的偏振相同而导致的干涉图样的最大强度。 。 SU-8负性光刻胶获得的实验结果与理论预测吻合良好。这种制造技术可用于光子晶体研究中。

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