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Formation of TiO_2 Thin Film on Antibacterial Metal Injection Molding Stainless Steel Orthodontic Bracket 17-4 PH Using Physical Vapor Deposition Method

机译:使用物理气相沉积法形成TiO_2薄膜抗菌金属注射成型不锈钢正畸括号17-4 pH

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This study aims to equip orthodontic bracket SS 17-4 PH fabricated using metal injection molding with antibacterial properties. This can be achieved by applying TiO_2 coating on the surface of brackets using magnetron sputtering PVD method. This method is chosen due to its compatibility to be used on bulk metal and its ability to control thin-film stoichiometry. Samples were prepared using the series of following steps which comprised of metal injection molding, binder elimination with solvent and thermal debinding, sintering in vacuum and argon atmosphere, electropolishing, and magnetron sputtering PVD coatings as the final stage. Negative bias, sputtering power, and partial pressure on vacuum chamber were set as the constant parameters. The atmosphere inside the PVD chamber was controlled using oxygen and argon gases. XRD and SEM observations were carried out to obtain the information on the phase and morphology of the films. Rutile and anatase crystalline structures with 2,27 nm and 9,78 nm crystal size were measured in as-deposited PVD TiO_2 respectively. The deposition films were achieved in the range of 3 ?m-8 ?m.
机译:本研究旨在使用金属注射成型与抗菌性能配备正畸括号SS 17-4 pH。这可以通过使用磁控溅射PVD方法在支架表面上施加TiO_2涂层来实现。由于其在散装金属上使用的兼容性及其控制薄膜化学计量能力而选择该方法。使用由金属注塑成型的一系列步骤制备样品,该系列包括金属注射成型,粘合剂消除溶剂和热脱滴,真空烧结和氩气氛,电抛光和磁控管溅射PVD涂层作为最终阶段。将负偏置,溅射功率和真空室的分压设定为恒定参数。使用氧气和氩气来控制PVD室内的气氛。进行了XRD和SEM观察,以获得有关薄膜的相位和形态的信息。用2,27nm和9,78nm晶体尺寸的金红石和锐钛矿结晶结构分别在沉积的PVD TiO_2中测量。沉积膜在3℃的范围内实现。

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