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Optical Band Gaps and Electrical Conductance of Si nanocrystals in SiO_2 Matrix for Optoelectronic Applications

机译:用于光电应用的Si纳米矩阵中Si纳米晶体的光带间隙和电导

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In this study, silicon nanocrystal (Si-nc) films were synthesized by compositing of Si-nc powder embedded in silicon oxide phase. The Si-nc film produced by the spin-coating methode using Tetraethylorthosilicate, ethanol, phosphoric acid, and Si-nc powder as suspension precursors. The variation in structural and optical properties of Si-nc sol films with the amounts of Si-nc powder have been characterized. Atomic force microscopy (AFM) shows that low density level of Si-nc power can result in the amount of porosity in the Si-nc films. It is found that when the Si-nc films have the higher Si-nc density, the small pores in the SiO_2 phase were removed. In addition, optical energy gap (E_g) of Si-nc samples was evaluated by the Tauc plot method. It is a crucial attribute for a promising photonic device. The obtained optical bang gap values were extended from 1.10 eV to 1.40 eV as compared with the typical Si bulk. In addition, density of Si-nc clusters has a considerable effect on the electrical conductance of the Si-nc films measured at room temperature.
机译:在该研究中,通过在氧化硅相中的Si-NC粉末合成来合成硅纳米晶(Si-NC)膜。由旋乙醇硅酸盐,乙醇,磷酸和Si-NC粉末作为悬浮前体制备的Si-NC膜。已经表征了Si-NC溶胶膜的结构和光学性质的变化。已经表征了Si-NC粉末的量。原子力显微镜(AFM)表明,Si-NC功率的低密度水平可导致Si-NC膜中的孔隙率。发现当Si-NC膜具有较高的Si-NC密度时,除去SiO_2相中的小孔。另外,通过Tauc图法评估Si-NC样品的光学能隙(E_G)。这是一个有前途的光子器件的关键属性。与典型的Si散装相比,所获得的光学爆炸间隙值从1.10 EV延伸至1.40eV。另外,Si-NC簇的密度对在室温下测量的Si-NC膜的电导产生了相当大的影响。

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