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Carbon-titanium multilayer films: Synthesis and characterization

机译:碳 - 钛多层薄膜:合成和表征

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To synthesize Carbon-Titanium (C-Ti) multilayer thin films deposited on silicon substrates was used Thermionic Vacuum Arc (TVA) method. The coated layers consisted of a base layer of about 100 nm of Carbon deposited at low evaporation rates. Subsequently, seven Carbon and Titanium layers were deposited alternatively on top of Carbon base layer, each of them has a final thickness up to 40 nm. In this study we obtained different batches of samples by variation of the substrate temperature between 0°C and 300°C, and the ion acceleration voltage applying a negative substrate bias voltage between 0V and -700V. To characterize the microstructure properties of as prepared C-Ti multilayer structures were used Electron Microscopy techniques (TEM, SEM, STEM) and Raman Spectroscopy. Results of tribological measurements are associated with the occurrence of atomic diffusion processes at Ti/C interface. To characterize the electrical conductive properties, the electrical resistance versus temperature have been measured.
机译:为了合成沉积在硅基板上的碳 - 钛(C-Ti)多层薄膜被使用热原真空弧(TVA)方法。涂覆层由沉积在低蒸发速率下沉积约100nm的碳的基层。随后,七个碳和钛层替代地沉积在碳基层的顶部,每个含量最终厚度高达40nm。在该研究中,我们通过在0℃和300℃之间的基板温度的变化以及施加在0V和-700V之间的负基板偏置电压的离子加速电压来获得不同批次的样品。为了表征如制备的C-Ti多层结构的微观结构性质被用电子显微镜技术(TEM,SEM,茎)和拉曼光谱。摩擦学测量结果与Ti / C界面的发生原子扩散过程的发生相关。为了表征导电性能,测量了电阻与温度。

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