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Deposition of CVD Diamond Coatings on Carbon Fiber Composite Substrates

机译:CVD金刚石涂层对碳纤维复合材料基材的沉积

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Boron doped diamond coatings are used in electrochemistry, due to the high overvoltage for oxygen generation. Niobium is often used as bulk material, but also diamond deposition on titanium was demonstrated. For metallic bulk materials corrosion can take place in case of defects in the diamond coating. This problem can be avoided by using carbon based substrates. Diamond deposition on carbon substrates is difficult, because atomic Hydrogen needed for diamond growth attacks graphitic and amorphous carbon. These reactions have the effects that carbon in the substrate is etched and the amount of atomic hydrogen needed for diamond growth is reduced. To reduce the carbon etching on the substrate, the duration till diamond layer formation should be short. By controlling the diamond deposition conditions, boron addition and seeding with diamond prior to deposition, the formation of diamond coatings on carbon fibre composites (CFC) is possible. Electrochemical measurements of the boron doped diamond coatings verified the excellent electrochemical properties of the samples, e.g. good electrical conductivity, high overvoltage for oxygen and hydrogen but also chemical inertness.
机译:硼掺杂金刚石涂层用于电化学,由于氧气产生高过电压。铌通常用作散装材料,但还证明了钛上的金刚石沉积。对于金属散装材料,可以在金刚石涂层缺陷的情况下进行腐蚀。通过使用基于碳的基板可以避免该问题。碳基材上的金刚石沉积难,因为金刚石生长攻击石墨和无定形碳所需的原子氢。这些反应具有蚀刻基材中的碳的效果,并且减少了金刚石生长所需的原子氢量。为了减少基板上的碳蚀刻,持续时间至金刚石层的形成应短。通过控制金刚石沉积条件,在沉积前用金刚石加入和播种,可以在碳纤维复合材料(CFC)上形成金刚石涂层。硼掺杂金刚石涂层的电化学测量验证了样品的优异电化学性质,例如,良好的导电性,氧气和氢气过电压,但也具有化学惰性。

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