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Performance Evaluation of Double Gate Junctionless Field Effect Transistor with Vertical Gaussian Doping Profile

机译:具有垂直高斯掺杂型材的双栅极连接场效应晶体管性能评价

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This paper presents, a simulation based study of Double Gate Junctionless Field Effect Transistor (DG-JLFETs) with Vertical Gaussian Doping profile. The proposed device structure improves the ON to OFF drain current ratio (by ≈ 10~5), threshold voltage roll off (by ≈ 30 mV),Drain Induced Barrier Lowering (DIBL) (by ≈ 29 mV/V) and Sub-threshold swing (by ≈ 6 mV/dec at straggle parameter σ≈ 3.75 nm in comparison to uniformly doped channel double gate junctionless Field effect transistors.
机译:本文提出了一种基于模拟的双栅极连接场效应晶体管(DG-JLFET)研究,具有垂直高斯掺杂型材。所提出的器件结构改善了漏极漏极电流比(≈10〜5),阈值电压滚动(通过≈30mV),漏极感应屏障降低(DIBL)(≈29mV/ v)和子阈值挥杆(在Straggle参数Σ≈3.75nm,与均匀掺杂的通道双栅极连接场效应晶体管相比之下。

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