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Simulation of mechanical properties of the movable nanowire for high speed nonvolatile Nanoelectromechanical (NEMS) memory devices

机译:高速非易失性纳米机电(NEMS)存储装置的可移动纳米线的力学性能模拟

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In this paper, we present the mechanical properties of the movable nanowire (SiO)for a proposed high speed nonvolatile Nanoelectromechanical (NEMS) memory devices. The NEMS memory consists of nanowire of SiO clamped at both the ends. By applying voltage across the two electrodes, placed on the either side of the nanowire, buckling of the nanowire occurs which facilitates reading and writing of data. Using 3-D FEM simulation, we have analyzed the maximum stress and maximum displacement of the NEMS memory nanowire with respect to its beam length and applied switching force. For a fixed force of 10 μN and varying the beam length, we got the maximum displacement of 35 μm with a beam length of 20 μm but at the same time stress was also maximum. This large displacement has some serious implications like permanent deformation or breakdown of nanowire. Maximum stress in this case can cause to the breakdown of nanowire. So we do not prefer the maximum stress case in device applications. For the fixed beam length of 1μm and varying the force we got maximum displacement of 0.012 μm with applied force of 25 μN.
机译:在本文中,我们介绍了可移动纳米线(SiO)的机械性能,用于提出的高速非易失性纳米机电(NEMS)存储器件。 NEMS内存包括在两端的SIO纳米线组成。通过将两个电极的电压施加在纳米线的任一侧,发生纳米线的屈曲,这有利于读取和写入数据。使用3-D有限元模拟,我们已经分析了NEMS内存纳米线相对于其光束长度和施加的切换力的最大应力和最大位移。对于10μN的固定力并改变光束长度,我们得到了35μm的最大位移,光束长度为20μm,但同时应力也在最大值。这种大型位移具有一些严重的含义,如永久变形或纳米线的故障。这种情况下的最大压力可能导致纳米线的击穿。因此,我们不喜欢设备应用中的最大应力情况。对于固定光束长度为1μm并改变力,我们得到了0.012μm的最大位移,施加力为25μN。

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