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Digital Radiography and Computed Tomography Process Effect on Electronic Device Temperature and Circuit Performance

机译:数字造影和计算机断层扫描过程对电子设备温度和电路性能的影响

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Digital radiography and computed tomography are the effective nondestructive testing techniques for assessment of the anomalies and defects in the materials and structures. Depending on the applied system capabilities these methods can be used with various levels of resolution and degrees of penetration in different applications from thick sheets of metals to tiny plastic parts. NSI X-View M5000-CT Computed Tomography System is shown to be able to do digital radiography and computed tomography for metals with thickness up to 2 inches and electronic parts at the resolution of 2 microns. However, relatively long time of the X-ray beam exposure of sensitive electronic chips may have the undesirable effect on their performance in different ways such as temperature increase and electromagnetic radiation effect. In this research the influence of applied X-ray beam on the electronic chips over time is evaluated. The temperature of the chips was measured by remote infrared thermocouple and the amplitude of electromagnetic field was monitored at different stages of the inspection and scanning using EMF detector. Any unexpected change in the temperature of the chips and electromagnetic fields during the scanning process may have the damaging effect on the electronic device performance.
机译:数字射线照相和计算机断层扫描是用于评估材料和结构中异常和缺陷的有效无损检测技术。根据所应用的系统功能,这些方法可以在不同的应用中使用各种分辨率和渗透程度,从厚的金属片到微小的塑料部件。 NSI X-View M5000-CT计算机断层扫描系统被证明能够为具有厚度高达2英寸的金属的金属进行数字射线照相和计算机断层扫描,分辨率为2微米。然而,敏感电子芯片的X射线束曝光的相对较长的时间可能对它们的性能诸如温度升高和电磁辐射效应的不同方式具有不希望的影响。在这项研究中,评估了应用X射线束在电子芯片上随时间的影响。通过远程红外热电偶测量芯片的温度,并在检查和使用EMF检测器的不同阶段监测电磁场的幅度。扫描过程中芯片和电磁场温度的任何意外变化可能对电子设备性能具有损坏影响。

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