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Design and fabrication of a tuning fork shaped voltage controlled resonator with additional tuning electrodes for low-voltage applications

机译:用于低压应用的附加调谐电极的调谐叉形电压控制谐振器的设计和制造

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In this work a silicon voltage-controlled microelectromechanical tuning-fork resonator with electrostatic actuation and separate frequency tuning electrodes is presented. The released device is fabricated using a silicon-on-insulator (SOI) wafer by a 2-step process involving only Focused Ion Beam (FIB) masking and Cryogenic Deep Reactive Ion etching (DRIE). This process is ideal for rapid prototyping, as the time to turn a design into the final device is only a few hours. The design of the resonator is optimized to accommodate the restrictions of the fabrication process, to maximize the frequency tunability and to minimize the biasing voltage. Separating tuning and driving electrodes enables the resonance frequency adjustment by over 10000 ppm [f_(central) 1.5 MHz, quality factor Q ~ 2000) with a tuning voltage of 12 volts.
机译:在这项工作中,呈现了具有静电致动和单独频率调谐电极的硅电压控制的微机电调谐器。通过硅与绝缘体(SOI)晶片仅涉及聚焦离子束(FIB)掩模和低温深反应离子蚀刻(DRIE)的2步骤工艺制造释放的装置。这个过程非常适合快速原型设计,因为将设计变成最终设备的时间只是几个小时。优化谐振器的设计以适应制造过程的限制,以最大化频率可调性并最小化偏置电压。分离调谐和驱动电极使谐振频率调节超过10000ppm [f_(中央)1.5 MHz,质量因子Q〜2000),调谐电压为12伏。

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