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Spectroscopic ellipsometry, optical, structural and electrical investigation of sprayed pure and Sn-doped ZnO thin films

机译:喷涂纯和Sn0掺杂ZnO薄膜的光谱椭圆形测定,光学,结构和电气研究

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in this work, wé report the transparent pure and Sn-doped zinc oxide (ZnO). The films were deposited onto microscope glass substrate which was heated at 350±5C° by ultrasonic spray pyrolysis (U S P) deposition technique. The concentrations of Sn were selected within the range of 0-3% by step of 0.5% and the time deposition is kept at 5 min. A (002)-oriented wurtzite crystal structure was confirmed by X-rays patterns; and grain size varied within the range 7.37-14.84nm, and cristanillity is calculated goes from14.4 to 45.9%. Based on UV-VIS-IR analysis, the results revealed the high transparency of the sprayed films which exceeds 90%. The band gap energy was of 3.26-3.30 eV. The film thickness was estimated by spectroscopy ellipsometry and the found values were of 165-270nm. The refractive index is in the range of 2.75.The obtained electrical parameters were around 10~(18) cm~(-3), 3.6 cm~2/Vs, 1.6Ω.cm; 5.8cm~3/C. finally the Sn-doping has influenced the physical parameters of as- ground ZnO films
机译:在这项工作中,Wé报道了透明的纯净和Sn-掺杂的氧化锌(ZnO)。将薄膜沉积在显微镜玻璃基板上,通过超声波喷雾热解(U S P)沉积技术在350±5C°加热。将Sn的浓度选择在0-3%的步骤范围内0.5%,并将时间沉积保持在5分钟。通过X射线图案证实了(002) - 致抗体晶体结构;和晶粒尺寸在7.37-14.84nm的范围内变化,并且计算克里司法率从14.4到45.9%。基于UV-Vis-IR分析,结果显示出超过90%的喷涂膜的高透明度。带隙能量为3.26-3.30eV。通过光谱椭圆形估计膜厚度,并且发现的值为165-270nm。折射率在2.75的范围内。获得的电参数约为10〜(18)cm〜(-3),3.6cm〜2 / vs,1.6Ω.cm; 5.8cm〜3 / c。最后,Sn-掺杂物影响了ZnO膜的物理参数

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