Structural and Electronic Properties of Amorphous Ti-Ni Alloy Thin Films Prepared by Ion Beam Sputtering

摘要

Ti-Ni alloy thin films are prepared using ion beam sputtering at different Ar gas flow rate, and corresponding structural and electronic properties are investigated. The films are characterized by using grazing incidence X-ray reflectivity) and x- ray diffraction techniques in order to determine the structural changes with the argon (Ar) flow rate. The diffraction measurement confirms amorphous nature of all deposited thin films. The recorded core level spectra of Ti and Ni-2p also show shift in their binding energy to higher side with respect to pure element form, confirming Ti-Ni alloy phase formation at room temperatures. The Ti and Ni atomic concentration values obtained from fitted core-level spectra are found to decrease with higher Ar flow rate. In addition to this, valence band spectra also show changes in Ni3d density of states with Ar gas flow rate. The results are interpreted and discussed in terms of structural change with Ar flow rate.