Deoxification of Liquids for Advanced Semiconductors Processing

摘要

Deoxification offers new opportunities in Back End Of Line (BEOL) and also in Front End Of Line (FEOL) to optimize transistor performance. This work presents how to treat ultra pure water (UPW), with and without chemistry, to decrease oxygen concentration to reach ultra low levels. A new approach for a deoxification system will be discussed to meet these upcoming requirements. By creating a semi-empirical model considering the permeation of oxygen through tubes back into the liquid, the necessary dimensions of the deoxification system can be predicted and the final concentration at the point of use (POU) calculated. Parameters like gas flow and liquid flow rate, material, grade of inert gas and system pressure were varied. The efficiency of measures to avoid oxygen permeation after the deoxification step is evaluated as well.