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Study of strain balance in long wavelength infrared InAs/GaSb superlattice materials

机译:长波长红外INAS / GASB超晶格材料的应变平衡研究

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The epitaxial growth parameters optimized for mid wavelength infrared (MWIR) InAs/GaSb superlattice (SL) growth are not necessarily the best parameters for very long wavelength infrared (VLWIR) SL growth. While the cutoff wavelength of the SL structure can be easily extended from a MWIR to a VLWIR spectral range by increasing InAs layer thickness with a fixed GaSb layer thickness, the structural and optical properties of SLs are changing as well, and these changes are not necessarily beneficial to the material quality of VLWIR SLs. For instance, tensile strain in the SL rapidly increases as InAs layer thickness increases. This impacts the interface growth processes used to strain balance the average lattice constant of the SL to match the GaSb substrate, the interface engineering in a VLWIR SL is very different than that in a MWIR SL. Using a baseline SL design of 16 monolayers (MLs) InAs/7 MLs GaSb, a systematic study of controlling the Sb/As background pressure and shutter sequence during interface formation was performed in order to minimize tensile strain in the VLWIR SLs. The effect of various shutter sequences on the SL morphological quality and their impact on optical spectral response is reported. By inserting 0.5 MLs of InSb-like interfaces, using a migration-enhance-epitaxy technique, in the baseline SL design, while maintaining a total SL period of 23 MLs, we achieved a high structural quality, strain balanced LWIR SL with a photoresponse onset at 15 pm.
机译:用于波长红外(MWIR)的InAs /超晶格的GaSb(SL)生长中期优化外延生长参数不一定是对于非常长波长红外线(VLWIR)SL增长的最佳参数。虽然SL结构的截止波长可以容易地从一个MWIR到VLWIR光谱范围通过具有固定的GaSb层厚度的增加的InAs层厚度延伸,超晶格的结构和光学性质被改变,以及,而这些变化并不一定有利于VLWIR超晶格材料的质量。例如,在对SL拉伸应变急剧增大作为的InAs层厚度的增加。这会影响用于应变平衡SL到在GaSb基板相匹配的平均晶格常数的界面生长过程,在一个VLWIR SL的界面的工程是比在MWIR SL非常不同的。使用的16个单层的基线设计SL(MLS)的InAs / 7的ML的GaSb,控制所述的Sb的系统研究/ AS期间的界面形成背景压力和快门序列以最小化在VLWIR SL的拉伸应变下进行。被报告了SL形态质量及其对光学光谱响应影响的各种快门序列的效果。通过插入的InSb的状接口0.5 MLS,使用迁移增强外延技术,在基线SL设计,同时保持23分的ML总SL期间,我们实现了高的结构质量,应变平衡LWIR SL与光响应发病在15日下午。

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