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Preparation of Fe-Ga Magnetostrictive Alloy Thin Films by Ion-plating Process

机译:离子电镀工艺制备Fe-Ga磁致伸缩合金薄膜

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Very few studies have been reported on preparation of a Fe-Ga alloy with ion plating process. In this study, the Fe-Ga magnetostrictive thin films were prepared by ion plating process with dual vapor source and discussed on effects of excess energy on thin film characteristics. The magnetostriction of film samples increased with increasing of Ga concentration. The excess energy with incidence of ion into the depositing film surface seems to be a key factor for magnetostrictive properties.
机译:据报道,在具有离子电镀工艺的Fe-Ga合金的制备上据报道了很少。在该研究中,通过具有双蒸气源的离子镀过程制备Fe-Ga磁致伸缩薄膜,并讨论过量能量对薄膜特性的影响。薄膜样品的磁致伸缩随着GA浓度的增加而增加。具有离子入射到沉积膜表面的过量能量似乎是磁致伸缩性能的关键因素。

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